POSITIVE RESIST COMPOSITION

摘要

PURPOSE: Provided is a positive resist composition which is excellent in the resolving power and the exposure margin, and can be suitably used for micro-photofabrication using far ultraviolet rays, particularly ArF excimer laser beams. CONSTITUTION: The positive resist composition comprises (A) a resin which has an aliphatic cyclic hydrocarbon group and enhances the dissolution rate in an alkaline developing solution by an acid, and (B) a compound generating an acid by irradiation of actinic ray or radiation.