发明名称 Vacuum deposition system
摘要 A vacuum deposition system comprising a vacuum chamber used for keeping a vacuum atmosphere within an inner space thereof for film deposition and an auxiliary device used in the vacuum chamber for assisting film deposition, wherein the auxiliary device is mounted so as to extend in the outside and inside of the vacuum chamber through an opening defined in the vacuum chamber such that the auxiliary device is secured to a stationary structural member disposed outside the vacuum chamber while being attached to the vacuum chamber by a connection member having elasticity and formed from a material capable of maintaining the vacuum atmosphere within the vacuum chamber.
申请公布号 US2002129770(A1) 申请公布日期 2002.09.19
申请号 US20020099502 申请日期 2002.03.15
申请人 OKAMOTO KOICHI;FUKUDA YOSHIMITSU 发明人 OKAMOTO KOICHI;FUKUDA YOSHIMITSU
分类号 B01J3/00;B01J19/00;C23C14/00;C23C14/30;C23C14/50;C23C14/54;H01L21/20;(IPC1-7):C23C16/00;B05C11/00 主分类号 B01J3/00
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