PLASMA TREATMENT DEVICE

摘要

A parallel flat plate type plasma treatment device (1), wherein a baffle plate (28) is installed by fitting between the ceiling (2b) and the side wall (2a) of a chamber (2), whereby the baffle plate (28) encloses plasma in the upper part of the chamber (2) and forms a return route for return current to a high frequency power supply (27), and the return current flowing through the baffle plate (28) returns to the high frequency power supply (27) through the ceiling (2b) of the chamber (2).