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发明名称
SUSPENSION ZUM CHEMISCH-MECHANISCHEN POLIEREN VON KUPFER/TANTALUM-SUBSTRATEN
摘要
申请公布号
DE69902539(D1)
申请公布日期
2002.09.19
申请号
DE19996002539
申请日期
1999.06.25
申请人
CABOT MICROELECTRONICS CORP., AURORA
发明人
KAUFMAN, BRUSIC;KISTLER, C.;WANG, SHUMIN
分类号
C09G1/02;H01L21/304;H01L21/3205;H01L21/321;(IPC1-7):C09G1/02
主分类号
C09G1/02
代理机构
代理人
主权项
地址
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