发明名称 |
PHOTOMASK FOR GRAY TONE EXPOSURE AND METHOD FOR APPLYING PHOTOSENSITIVE RESIN |
摘要 |
PROBLEM TO BE SOLVED: To solve the first problem that the taper angle of an ordinary film thickness part becomes smaller near gray tone exposure and the second problem that it is difficult to make gray tone film thickness uniform. SOLUTION: In order to solve the first problem, the interval between patterns for gray tone exposure is made narrower at the center and wider at the peripheries. In order to solver the second problem, photosensitive resins different from each other in optical sensitivity are applied two or more times and an exposure reaction is accelerated only in the upper photosensitive resin. |
申请公布号 |
JP2002268200(A) |
申请公布日期 |
2002.09.18 |
申请号 |
JP20010068948 |
申请日期 |
2001.03.12 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
TAKEGAWA HIROZO |
分类号 |
G03F7/095;G03F1/54;H01L21/027 |
主分类号 |
G03F7/095 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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