| 发明名称 |
COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST |
| 摘要 |
PROBLEM TO BE SOLVED: To obtain a resin for photoresist which is excellent in homogeneity and can give a fine pattern with a high resolution. SOLUTION: A compound represented by formula (1) (wherein R<a> is H or methyl; and R<1> is a 1-10C hydrocarbon group) is provided. |
| 申请公布号 |
JP2002265530(A) |
申请公布日期 |
2002.09.18 |
| 申请号 |
JP20010062435 |
申请日期 |
2001.03.06 |
| 申请人 |
DAICEL CHEM IND LTD |
发明人 |
TSUTSUMI KIYOHARU;ITOKAZU TERUO |
| 分类号 |
G03F7/027;C07C69/54;C08F20/18;C08F220/18;C08F220/26;C08F222/06;C08F232/08;C08K5/00;C08L33/04;G03F7/039;H01L21/027 |
主分类号 |
G03F7/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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