POSITIVE TYPE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive type resist composition suitable for use in microphotofabrication using far ultraviolet light, particularly ArF excimer laser light and excellent in resolving power and margin for exposure. SOLUTION: The positive type resist composition contains (A) a resin having a specified alicyclic hydrocarbon group in a side chain and having a velocity of dissolution in an alkali developing solution increased by the action of an acid and (B) a specified compound which generates the acid when irradiated with active light or radiation.