| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a diamond coat film deposited photomask plate having high water repellency and hardness, capable of preventing electrostatic discharge damage and washable after modification with a gold paste and to provide a method for producing the photomask plate. SOLUTION: The method for producing the diamond coat film deposited photomask plate comprises a step for vapor-depositing chromium on a glass substrate, a step for forming a photosensitive resist layer by applying a photosensitive resist on the resulting chromium layer, a step for exposing the photosensitive resist layer according to patterning data, a step for developing the exposed photosensitive resist layer with a developer, a step for etching the disclosed chromium layer with an etchant, a step for removing the developed photosensitive resist layer with a remover and a step for depositing a diamond coat film which is a diamond-like carbon film as a protective film.</p> |
