METHOD OF PRODUCING OPTICAL REFLECTING SURFACE, AND OPTICAL ELEMENT, SUB-MOUNT FOR LD AND OPTICAL PICKUP

摘要

PROBLEM TO BE SOLVED: To realize faces usable for an optical reflecting surface by one anisotropic etching with an etching mask of optional shape, using anisotropic etching of Si. SOLUTION: In this method of producing the optical reflecting surface, wherein the optical reflecting surface consisting of 111 faces is formed on a monocrystal Si substrate with 100 faces, using anisotropic etching, the shape of the etching mask for forming the optical reflecting surface is formed into a circular or polygonal recessed shape comprising segments with angles larger than 1 deg. and smaller than 44 deg. to the direction of the faces 111 predicted from orientation flat.