发明名称 |
METHOD OF CLEANING LIQUID CRYSTAL RESIN MELT POLYMERIZATION APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of cleaning a liquid crystal resin melt polymerization apparatus which easily removes cleaning residues and the like attached to the inner side of the liquid crystal resin melt polymerization apparatus and does not adversely affect the discharge of a liquid crystal resin after cleaning. SOLUTION: The method of cleaning a liquid crystal resin melt polymerization apparatus is characterized in cleaning the liquid crystal resin melt polymerization apparatus with the use of a cleaning composition composed of 100 pts.wt. glycols and 0.01-35 pts.wt. alkali compound.
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申请公布号 |
JP2002265578(A) |
申请公布日期 |
2002.09.18 |
申请号 |
JP20010068438 |
申请日期 |
2001.03.12 |
申请人 |
TORAY IND INC |
发明人 |
KUREMATSU TOSHIO;MIYAUCHI KUNIHIKO |
分类号 |
C11D7/06;C08G63/78;C08G69/44;C11D7/10;C11D7/12;C11D7/16;C11D7/26;C11D7/50;(IPC1-7):C08G63/78 |
主分类号 |
C11D7/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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