| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive composition giving a planographic printing plate excellent in wear and printing resistances, developable even with an exhausted developing solution in a short time and ensuring wide developing conditions. SOLUTION: In the photosensitive composition containing a vinyl polymerized high molecular compound insoluble in water and soluble in an alkaline aqueous solution and o-naphthoquinone diazide, the vinyl polymerized high molecular compound is a copolymer containing at least one monomeric unit derived from (A) a monomeric compound having an active imino group represented by a specified formula and at least one monomeric unit derived from (B) a monomeric compound having an ester chain represented by a specified formula. |
