发明名称 |
FILM THICKNESS MEASURING INSTRUMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a film thickness measuring instrument which prevents a sample for correction from having secular changes. SOLUTION: The film thickness measuring instrument which measures the thickness of a thin film on the surface 8a of a sample according to measurement information on the quantity of polarization variation has a reloading stage 7 for the sample or the sample 21 for correction arranged nearby the stage 7 and is also equipped with a gas supply means 24 which purges the atmosphere around the sample surface with inert gas.
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申请公布号 |
JP2002267419(A) |
申请公布日期 |
2002.09.18 |
申请号 |
JP20010071801 |
申请日期 |
2001.03.14 |
申请人 |
HORIBA LTD |
发明人 |
DEJIMA TAKUMI;OTSUKI KUNIO;KATANISHI AKIHIRO |
分类号 |
G01B11/06;H01L21/66;(IPC1-7):G01B11/06 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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