| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a phase shift mask which enables a light shielding film to uniformly be deposited even at a step part of a substrate and its manufacturing method. SOLUTION: This manufacturing method for a substrate digging type phase shift mask which has a shifter part 180 and a non-shifter part 185 adjacently to each other and also has a light shielding layer pattern formed of a light shielding film 150 continuously covering the end part of the shift part to the end part of the non-shifter part including the flank part 116 of a recessed part 115 for forming the shifter part so that the flank part slants spreading toward the top surface of the substrate 110, has (a) a resist pattern forming process of boring the shifter part and forming a resist pattern directly on the substrate, (b) a dry etching process of forming the shifter part by dry etching using the resist pattern as an etching-resistive mask, and (c) a light shielding layer pattern forming process of forming the light shading layer pattern by a photoetching method after depositing the light shielding film.</p> |
