发明名称 MICROMIRROR AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a micromirror which can be displaced at a high speed over a wide angle and a method of manufacturing the same. SOLUTION: A polycrystalline silicon film 15 containing an impurity, for example, phosphorus (P) is formed on the surface on the front side from a moving segment 13A to a stationary segment 13B of a hinge section 13 and an aluminum (Al) film 16 is formed on the surface on the rear side of the moving segment 13A of the hinge section 13. As a result, the polycrystalline silicon film 15 and the Al (aluminum) film 15 constitute a bimorph structure across the hinge section 13 consisting of silicon nitride. When the polycrystalline silicon film 15 is energized, the hinge section 13 is heated by the Joule heat of the polycrystalline silicon and as a result of the same, both of the polycrystalline silicon film 15 and the Al film 15 thermally expand and the mirror section 12 is displaced together to the moving segment 13A. Since the mirror section 12 is inclined with the hinge section 13, the additionally greater angular displacement can be obtained in the mirror section 12 at the top end.
申请公布号 JP2002267956(A) 申请公布日期 2002.09.18
申请号 JP20010065070 申请日期 2001.03.08
申请人 SONY CORP 发明人 HARA MASATERU;MAKINO TAKUYA;HORI KAZUHITO;HANE KAZUHIRO;SASAKI MINORU
分类号 B81B3/00;B81C1/00;G02B26/08;G02B26/10;(IPC1-7):G02B26/08 主分类号 B81B3/00
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