| 摘要 |
PROBLEM TO BE SOLVED: To provide a super-precision working method for flattening semiconduc tor, etc., utilizing composite action of abrasive grains in slurry with chemical action of substance added to the slurry. SOLUTION: Titanium oxide TiO2 is mixed into a working fluid in the form of particulates, and free radicals of OH or HO2 are generated in the working fluid by photocatalyst action of titanium oxide. Precision polishing is thus conducted by use of oxidation force of it. |
