发明名称 PLASMA PROCESSOR AND PLASMA PROCESSING METHOD USING INVERTER CIRCUIT
摘要 PROBLEM TO BE SOLVED: To provide the miniaturized plasma processor of high energy efficiency by which the power loss of the protective resistor of an impulse circuit is reduced. SOLUTION: An inverter circuit S1 generates the rectangular wave AC voltage of a high frequency from a commercial AC voltage. Then, the pulse transformer 31 of a small capacity generates a high frequency high voltage by boosting the rectangular wave AC voltage and a full wave rectifier 34 generates a DC high voltage in a pulsating current shape by full-wave rectifying the high frequency high voltage. Thereafter, the impulse circuit S4 generates the pulse voltage of a high voltage/a high frequency from the DC high voltage, applies it between a discharge electrode 1 and a counter electrode 2 and generates corona discharges and then plasma 3. Since the pulse transformer 31 is of small capacity, the plasma processor is miniaturized. Since the DC high voltage is in the pulsating current shape, the power loss of the protective resistor is reduced and the energy efficiency is improved.
申请公布号 JP2002263472(A) 申请公布日期 2002.09.17
申请号 JP20010061975 申请日期 2001.03.06
申请人 NIPPON PAINT CO LTD 发明人 AKUTSU KENSUKE
分类号 H05H1/46;B01J19/08 主分类号 H05H1/46
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