SUBSTRATE TO BE COATED, COATING APPARATUS CONTAINING THE SAME, COATING METHOD, AND ELEMENT PRODUCTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate to be coated, a coating apparatus containing the substrate, and a coating method with which the film thickness on the substrate to be coated with a resist having a curved face is prevented from becoming uneven. SOLUTION: The substrate to be coated has a curved face portion in at least one face and is to be coated with a coating material in at least the curved face portion. Peripheral face parts are formed in a manner that the coating material dropwise titrated to the tip part of the curved face portion, following the rotation of the substrate to be coated itself flows down smoothly toward the peripheral parts of the curved face portion while keeping the film thickness even. Consequently, the film thickness in the curved face portion can be made even.