| 发明名称 |
Polycyclic resist compositions with increased etch resistance |
| 摘要 |
Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.
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| 申请公布号 |
US6451499(B1) |
申请公布日期 |
2002.09.17 |
| 申请号 |
US20000604749 |
申请日期 |
2000.06.27 |
| 申请人 |
THE B.F. GOODRICH COMPANY;INTERNATIONAL BUSINESS MACHINES CORP. |
发明人 |
JAYARAMAN SAIKUMAR;GOODALL BRIAN LESLIE;RHODES LARRY FUNDERBURK;SHICK ROBERT ADAM;VICARI RICHARD;ALLEN ROBERT DAVID;OPITZ JULIANN;SOORIYAKUMARAN RATNAM;WALLOW THOMAS |
| 分类号 |
C08F4/80;C08F32/08;C08F232/08;C08G61/06;C08G61/08;G03F7/004;G03F7/038;G03F7/039;(IPC1-7):G03F7/004 |
主分类号 |
C08F4/80 |
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