发明名称 Radiation source for use in lithographic projection apparatus
摘要 A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.
申请公布号 US6452194(B2) 申请公布日期 2002.09.17
申请号 US20000735641 申请日期 2000.12.14
申请人 ASML NETHERLANDS B.V. 发明人 BIJKERK FREDERIK;FIEDOROWICZ HENRYK;DE BRUIJN CORNELIS C.;BARTNIK ANDRZEJ;KOSHELEV KONSTANTIN N.;BANINE VADIM Y.
分类号 H01L21/027;G03F7/20;H05G2/00;(IPC1-7):G21K5/10;H01J37/08 主分类号 H01L21/027
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