发明名称 |
Radiation source for use in lithographic projection apparatus |
摘要 |
A radiation source of a radiation system of a lithographic projection apparatus comprises electrodes for creating a discharge in a space between them such that the discharge collapses into a pinch volume. The collapsing discharge creates a highly ionized, high temperature plasma in the pinch volume. A working fluid is ejected from a jet nozzle into the pinching volume and is thereby raised to a high temperature state and emits extreme ultraviolet radiation.
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申请公布号 |
US6452194(B2) |
申请公布日期 |
2002.09.17 |
申请号 |
US20000735641 |
申请日期 |
2000.12.14 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BIJKERK FREDERIK;FIEDOROWICZ HENRYK;DE BRUIJN CORNELIS C.;BARTNIK ANDRZEJ;KOSHELEV KONSTANTIN N.;BANINE VADIM Y. |
分类号 |
H01L21/027;G03F7/20;H05G2/00;(IPC1-7):G21K5/10;H01J37/08 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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