| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition system for superfine particles for which a plasma condition and a nozzle condition are independently controlled. SOLUTION: This film deposition system for depositing the superfine particles in aerosol on a substrate is provided with an evacuatable film deposition chamber to which gas is introduced and an evacuatable nozzle chamber connected to the film deposition chamber and equipped with a nozzle for forming the flow of the aerosol. A barrier wall is formed between the film deposition chamber and the nozzle chamber and the barrier wall is provided with an opening part capable of maintaining a pressure difference between the film deposition chamber and the nozzle chamber and making pass through the superfine particles discharged from the nozzle. A substrate holder for holding the substrate so as to face the nozzle, whose relative position can be displaced to the nozzle, is equipped inside the film deposition chamber. As a plasma generation means not obstructing the flying of the superfine particles to the substrate, a power source means for applying voltage for plasma generation to the substrate holder is provided. |
