| 发明名称 |
Method to overcome image shortening by use of sub-resolution reticle features |
| 摘要 |
Image shortening in a photolithographic process is substantially reduced by using sub-resolution reticle features to alter the aerial image in the shortened regions. The use of such sub-resolution reticle features is simple to implement in a design system, and allows for increased feature aspect ratio as well as overlap to other critical features.
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| 申请公布号 |
US6451490(B1) |
申请公布日期 |
2002.09.17 |
| 申请号 |
US20000709091 |
申请日期 |
2000.11.08 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ADVOCATE WILLIAM H.;BUKOFSKY SCOTT J.;FEILD CHRISTOPHER ADAM;SAMUELS DONALD J. |
| 分类号 |
G03F1/00;G03F1/14;G03F7/20;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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