发明名称 AUTOMATIC CONTINUOUS WAFER PROCESSING SYSTEM AND METHOD FOR PROCESSING WAFER USING THE SAME
摘要 PURPOSE: An automatic continuous wafer processing system and a method for processing a wafer using the same are provided to reduce an area of processing modules in a production line by forming the processing modules with one body. CONSTITUTION: A plurality of track modules(10,20) have a track body, a plurality of processing modules for processing wafers, and a track robot for transferring the wafers to the processing modules, respectively. A wafer division tower(30) includes a tower body having division paths, an aligner fixed to an inside of the tower body, and an elevation robot for elevating the wafers from the aligner to each place corresponding to the division paths. A plurality of load lock units(40) are installed between the track modules(10,20) and the wafer division tower(30) in order to store the wafers, temporarily and separate the wafer division tower(30) from the track modules(10,20). The number of the track modules(10,20) is equal to the number of the load lock units(40).
申请公布号 KR20020072448(A) 申请公布日期 2002.09.16
申请号 KR20010012438 申请日期 2001.03.10
申请人 INTEGRATED PROCESS SYSTEMS 发明人 BAE, JANG HO;BAEK, CHUN GEUM;CHOI, CHANG HWAN;KYUNG, HYEON SU;LIM, HONG JU;PARK, YEONG HUN
分类号 H01L21/00;H01L21/677;(IPC1-7):H01L21/00 主分类号 H01L21/00
代理机构 代理人
主权项
地址