| 摘要 |
A floating gate with sharp corner is disclosed. Wherein the sharp level of the sharp corners is control by the deposition thickness of the conductive spacers. The method comprises forming a first dielectric layer on the semiconductor substrate as a gate dielectric. A first conductive layer is formed on the first dielectric layer, and a second dielectric layer is then formed thereon. The second dielectric layer and the first conductive layer are next patterned. Subsequently, conductive spacers with sharp corners are created by well know anisotropical etching. A tunneling dielectric layer is then formed on the surface of a floating gate consisting of the spacers and patterned structure. A second conductive layer is formed on the tunneling dielectric layer as a control gate.
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