| 发明名称 |
Emissivity-change-free pumping plate kit in a single wafer chamber |
| 摘要 |
An apparatus that includes a pumping plate having a skirt, where the skirt contains a number of holes and a wafer access slot, and where the number of holes are sized and positioned to provide uniform heating of a susceptor.
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| 申请公布号 |
US2002127508(A1) |
申请公布日期 |
2002.09.12 |
| 申请号 |
US20020051651 |
申请日期 |
2002.01.15 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
JIN XIAOLIANG;WANG SHULIN;LUO LEE;HO HENRY;CHEN STEVEN A. |
| 分类号 |
C23C16/455;C23C16/44;C23C16/46;H01L21/00;H01L21/205;(IPC1-7):F27D1/00 |
主分类号 |
C23C16/455 |
| 代理机构 |
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