发明名称 |
Substrate positioning system |
摘要 |
A substrate positioning system is provided to facilitate the performing of certain processing on the substrate, such as ion implantation. The system comprises a linkage rotatably mounted to a base and an end effector member rotatably mounted to the linkage and configured for receiving a substrate. Through the synchronized rotation of the linkage about the base and the end effector member about the linkage, the system acts as a robotic unit to move the substrate to the desired location for performing processing thereon. In another aspect, the base is movable along an axis such that the system maintains a constant distance of travel for an ion beam incident on the substrate as the linkage and end effector member travel in a curved path.
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申请公布号 |
US2002125446(A1) |
申请公布日期 |
2002.09.12 |
申请号 |
US20020081610 |
申请日期 |
2002.02.20 |
申请人 |
VANDERPOT JOHN W.;BERRIAN DONALD W.;POLLOCK JOHN D. |
发明人 |
VANDERPOT JOHN W.;BERRIAN DONALD W.;POLLOCK JOHN D. |
分类号 |
G21K5/10;H01J37/317;H01L21/68;H01L21/687;(IPC1-7):G21K5/10 |
主分类号 |
G21K5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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