DRY ETCH APPARATUS IN FABRICATION PROCESS OF SEMICONDUCTOR DEVICE

摘要

PURPOSE: A dry etch apparatus in a fabrication process of a semiconductor device is provided to reduce deposition of polymer by forming an exhaust path in a focus ring in the dry etch apparatus. CONSTITUTION: A cathode(24) is used for supplying power for generating plasma. A wafer chuck(26) is installed at an upper portion of the cathode(24). A wafer is loaded on the wafer chuck(26). A focus ring is installed around the wafer chuck(26) and the wafer(W) on loaded on the wafer chuck(26). The focus ring is formed by a ceramic material. The focus ring is projected from a circumference of the wafer(W). The focus ring is used for concentrating the plasma of an inside of a chamber(20) on the wafer(W). An exhaust path is formed in the focus ring. The focus ring is divided into an upper body(28a) and a lower body(28b) by the focus ring.