发明名称 FeRAM having bottom electrode connected to storage node and method for forming the same
摘要 A FeRAM device in which a bottom electrode of a ferroelectric capacitor is connected to a source/drain region of a transistor and a top electrode is connected to a plate line. The FeRAM device comprises a semiconductor substrate; a gate electrode formed on the semiconductor substrate; an impurity region formed on each side of the gate electrode of the semiconductor substrate; a bottom electrode connected to the impurity region; an oxygen diffusion barrier layer formed on the bottom electrode; a ferroelectric layer formed on the oxygen diffusion barrier layer and the bottom electrode; and a top electrode formed on the ferroelectric layer.
申请公布号 US2002125523(A1) 申请公布日期 2002.09.12
申请号 US20010949083 申请日期 2001.09.10
申请人 OH SANG-HYUN 发明人 OH SANG-HYUN
分类号 H01L27/105;H01L21/02;H01L21/768;H01L21/8246;H01L27/115;(IPC1-7):H01L29/76;H01L21/824 主分类号 H01L27/105
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