发明名称 THIN FILM TRANSISTOR WITH SOURCE/DRAIN ELECTRODES IN DUAL LAYER STRUCTURE, FABRICATING METHOD THEREOF, AND ACTIVE MATRIX TYPE DISPLAY DEVICE USING THE TFT AND FABRICATING METHOD THEREOF
摘要 PURPOSE: A TFT with source/drain electrodes in a dual layer structure and a method for fabricating the same, and an active matrix type display device using the TFT and a method for fabricating the same are provided to simplify the fabricating procedure by using four masks for improving the yield. CONSTITUTION: A TFT includes source/drain electrodes(40-1,40-2) in a dual layer structure of a metal film(38) and a transparent conductive film(39), wherein the metal film is formed of one of Al, Al alloy, Mo, Mo alloy, Cr or Ti to have a lower specific resistance than the transparent conductive film, the transparent conductive film is formed of one of ITO, TO or IO, and the source/drain areas(35-1,35-2) are n-type or p-type conductive.
申请公布号 KR20020071059(A) 申请公布日期 2002.09.12
申请号 KR20010010840 申请日期 2001.03.02
申请人 SAMSUNG SDI CO., LTD. 发明人 PARK, SANG IL;SO, U YEONG;YOO, GYEONG JIN
分类号 H01L21/28;G02F1/136;G02F1/1362;H01L21/3205;H01L21/336;H01L21/77;H01L21/84;H01L23/52;H01L27/12;H01L29/417;H01L29/45;H01L29/786;(IPC1-7):G02F1/136 主分类号 H01L21/28
代理机构 代理人
主权项
地址