发明名称 |
Method and apparatus for localized liquid treatment of the surface of a substrate |
摘要 |
A method and apparatus for dispensing a liquid on the surface of a localized zone of a substrate, for example for cleaning of etching purposes. Along with the liquid, a gaseous tensio-active substance is supplied, which is miscible with said liquid and when mixed with the liquid, reduces the surface tension of said liquid, thus containing the liquid in a local zone of the substrate surface.
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申请公布号 |
US2002125212(A1) |
申请公布日期 |
2002.09.12 |
申请号 |
US20020074706 |
申请日期 |
2002.02.13 |
申请人 |
INTERUNIVERSITAIR MICRO-ELEKTRONICA CENTRUM, VZW |
发明人 |
MERTENS PAUL;MEURIS MARC;HEYNS MARC |
分类号 |
H01L21/00;(IPC1-7):C23F1/00;B08B3/02 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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