发明名称 |
Valve control system for atomic layer deposition chamber |
摘要 |
A valve control system for a semiconductor processing chamber includes a system control computer and a plurality of electrically controlled valves associated with the processing chamber. The system further includes a programmable logic controller in communication with the system control computer and operatively coupled to the electrically controlled valves. The refresh time for control of the valves may be less than 10 milliseconds. Consequently, valve control operations do not significantly extend the period of time required for highly repetitive cycling in atomic layer deposition processes. A hardware interlock may be implemented through the output power supply of the programmable logic controller.
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申请公布号 |
US2002127745(A1) |
申请公布日期 |
2002.09.12 |
申请号 |
US20010800881 |
申请日期 |
2001.03.07 |
申请人 |
LU SIQING;CHANG YU;SUN DONGXI;DANG VINH;YANG MICHAEL X.;CHANG ANZHONG ANDREW;NGUYEN ANH N.;XI MING |
发明人 |
LU SIQING;CHANG YU;SUN DONGXI;DANG VINH;YANG MICHAEL X.;CHANG ANZHONG ANDREW;NGUYEN ANH N.;XI MING |
分类号 |
C23C16/52;G05D7/06;H01L21/205;(IPC1-7):H01L21/66;C23C16/00;C23F1/00;G01R31/26 |
主分类号 |
C23C16/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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