发明名称 Semiconductor device and method for fabricating the same
摘要 A semiconductor device comprising: a storage electrode having a side wall forward taped; a capacitor dielectric film formed on the side wall of the storage electrode; and a plate electrode formed on the side wall of the storage electrode with the capacitor dielectric film interposing therebetween, the plate electrode having a side wall inversely tapered.
申请公布号 US2002127810(A1) 申请公布日期 2002.09.12
申请号 US20020140115 申请日期 2002.05.08
申请人 FUJITSU LIMITED 发明人 NAKAMURA SHUNJI
分类号 H01L21/02;H01L21/8242;H01L27/108;(IPC1-7):H01L21/336 主分类号 H01L21/02
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