发明名称 |
Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member , thin film forming apparatus and thin film forming method for producing metal film and metal oxide film |
摘要 |
The metal film of the present invention is a dense film of a single crystal that has very low surface roughness and very good crystal orientation because an arithmetic mean roughness of the surface is not larger than 2 nm and a (111) peak intensity of X-ray diffraction is not less than 20 times the sum of all other peaks. Also the metal oxide film of the present invention is a dense film that includes less oxygen defects and almost no voids therein because a content of a non-oxidized metal is not higher than 1 mole % of a metal component that constitutes the metal oxide and a packing density is 0.98 or higher.
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申请公布号 |
US2002126265(A1) |
申请公布日期 |
2002.09.12 |
申请号 |
US20020057822 |
申请日期 |
2002.01.24 |
申请人 |
OKURA TAKAHIRO;SHIMIZU KAZUYA;TAKEI MASAKAZU |
发明人 |
OKURA TAKAHIRO;SHIMIZU KAZUYA;TAKEI MASAKAZU |
分类号 |
C23C14/00;C23C14/08;C23C14/10;C23C14/14;C23C14/32;C30B23/02;G02B1/10;G21K1/06;(IPC1-7):G03B21/28;C23C16/00;H05H1/24 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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