| 发明名称 |
CLEANING SOLUTION FOR SEMICONDUCTOR WAFERS IN THE BACK-END-OF-LINE |
| 摘要 |
The invention relates to a cleaning solution for semiconductor wafers in the back-end-of-line (BEOL). Said solution contains water, tetramethylammonium hydroxide (TMAH) and ethylene glycol. The invention also relates to the use of such cleaning solutions and a method for cleaning semiconductor wafers in the BEOL. |
| 申请公布号 |
WO0245148(A3) |
申请公布日期 |
2002.09.12 |
| 申请号 |
WO2001EP13527 |
申请日期 |
2001.11.21 |
| 申请人 |
INFINEON TECHNOLOGIES AG;GEYER, STEFAN |
发明人 |
GEYER, STEFAN |
| 分类号 |
C11D7/26;C11D7/32;C11D11/00;G03F7/42;H01L21/02;H01L21/3213 |
主分类号 |
C11D7/26 |
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