发明名称 |
Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof |
摘要 |
An organic anti-reflective polymer which prevents back reflection of lower film layers and eliminates standing wave that is occurred by a thickness change of photoresist and light, in a process for fabricating ultrafine patterns that use photoresist for lithography by using 193 nm ArF and its preparation method. More particularly, the organic anti-reflective polymer of the present invention is useful for fabricating ultrafine patterns of 64M, 256M, 1G, and 4G DRAM semiconductor devices. A composition containing such organic anti-reflective polymer, an anti-reflective coating layer made therefrom and a preparation method thereof.
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申请公布号 |
US2002128410(A1) |
申请公布日期 |
2002.09.12 |
申请号 |
US20020037552 |
申请日期 |
2002.01.04 |
申请人 |
JUNG MIN-HO;JUNG JAE-CHANG;LEE GEUN-SU;SHIN KI-SOO |
发明人 |
JUNG MIN-HO;JUNG JAE-CHANG;LEE GEUN-SU;SHIN KI-SOO |
分类号 |
G03F7/11;C08F4/04;C08F4/34;C08F8/00;C08F116/34;C08F212/14;C08F220/06;C08F220/28;C08L25/18;C08L29/00;C08L33/14;C09D125/18;C09D133/14;G03F7/09;H01L21/027;(IPC1-7):C08F118/02 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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