发明名称 METHOD FOR MANUFACTURING A POLISHING PAD HAVING A COMPRESSED TRANSLUCENT REGION
摘要 A method for producing a polishing pad comprising (a) providing a porous polymer structure, (b) compressing at least a region of the porous polymer structure to provide a translucent region, and (c) forming a polishing pad comprising the porous polymer structure, whereby a polishing pad is produced comprising the translucent region. Also provided is a polishing pad produced according to this method, and a polishing pad comprising a region that is at least translucent, wherein the translucent region is porous, as well as a method of polishing a substrate using a pad of the invention.
申请公布号 WO02070200(A1) 申请公布日期 2002.09.12
申请号 WO2002US05958 申请日期 2002.02.27
申请人 CABOT MICROELECTRONICS CORPORATION 发明人 JONES, JEREMY;SEVILLA, ROLAND, K.
分类号 B24B37/013;B24B37/20;B24D7/12;B29C43/00;(IPC1-7):B24B37/04 主分类号 B24B37/013
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