发明名称 |
METHOD FOR MANUFACTURING A POLISHING PAD HAVING A COMPRESSED TRANSLUCENT REGION |
摘要 |
A method for producing a polishing pad comprising (a) providing a porous polymer structure, (b) compressing at least a region of the porous polymer structure to provide a translucent region, and (c) forming a polishing pad comprising the porous polymer structure, whereby a polishing pad is produced comprising the translucent region. Also provided is a polishing pad produced according to this method, and a polishing pad comprising a region that is at least translucent, wherein the translucent region is porous, as well as a method of polishing a substrate using a pad of the invention.
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申请公布号 |
WO02070200(A1) |
申请公布日期 |
2002.09.12 |
申请号 |
WO2002US05958 |
申请日期 |
2002.02.27 |
申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
JONES, JEREMY;SEVILLA, ROLAND, K. |
分类号 |
B24B37/013;B24B37/20;B24D7/12;B29C43/00;(IPC1-7):B24B37/04 |
主分类号 |
B24B37/013 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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