发明名称 Method of manufacturing thin film head
摘要 The method of the present invention is capable of manufacturing a thin film head, which includes a protection layer having enough corrosion-resisting property and water-repellent property, which is capable of keeping the magnetic head clean even if temperature and humidity are high, and which has enough durability and reliability. The method of manufacturing the thin film head, in which a pad, which contacts a disk, and a floating pattern are formed in a disk-side face, comprises the steps of: forming a adhesion layer on the disk-side face of a substrate, which is a main body of the thin film head; forming a protection layer on the adhesion layer; coating the protection layer with resist; patterning the resist so as to form a pad hole at a prescribed position, at which the pad is formed; forming a pad film on resist-coated faces including an inner face of the pad hole; and lifting off the resist so as to form the pad.
申请公布号 US2002127342(A1) 申请公布日期 2002.09.12
申请号 US20000726924 申请日期 2000.11.30
申请人 FUJITSU LIMITED 发明人 WATANUKI MOTOICHI;NAKAJIMA HIROYUKI
分类号 G11B5/60;G11B5/10;G11B5/255;G11B5/31;G11B5/40;G11B21/21;(IPC1-7):B05D1/36 主分类号 G11B5/60
代理机构 代理人
主权项
地址