发明名称 RAPID STEREOLITHOGRAPHY APPARATUS
摘要 PURPOSE: A rapid stereolithography apparatus is provided to remarkably reduce the lithography time by forming a resin in a required shape at once without using a separate negative mask. CONSTITUTION: A light is radiated into a photo-curable resin(10) so as to form an article. A rapid stereolithography apparatus includes a projector(11) for radiating a light into the photo-curable resin(10), a frame(12) for accommodating the photo-curable resin(10) therein, a stage for fixing the cured photo-curable resin(10), and a signal processing device for allowing the projector(11) to radiate the light in a required pattern. The stage(20) is installed at an upper portion of the frame(12). When the article is formed, the photo-curable resin(10) is lifted upward.
申请公布号 KR20020071185(A) 申请公布日期 2002.09.12
申请号 KR20010011159 申请日期 2001.03.05
申请人 KANG, SANG IL 发明人 KANG, SANG IL
分类号 B29C35/08;(IPC1-7):B29C35/08 主分类号 B29C35/08
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