发明名称 PASSIVATION OF POROUS SEMICONDUCTORS
摘要 <p>A method is disclosed for stabilizing porous silicon. A porous silicon structure having a surface terminated with hydrogen atoms is subjected to organic thermal processing to substitute the hydrogen atoms with a protective organic layer. The resulting structure are found to have unprecedented stability.</p>
申请公布号 CA2340535(A1) 申请公布日期 2002.09.12
申请号 CA20012340535 申请日期 2001.03.12
申请人 NATIONAL RESEARCH COUNCIL OF CANADA 发明人 WAYNER, DANIAL D. M.;MORIN, SYLVIE;LOCKWOOD, DAVID J.;BOUKHERROUB, RABAH
分类号 H01L21/312;(IPC1-7):H01L21/47;H01L21/477 主分类号 H01L21/312
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