发明名称 METHOD FOR FORMING MULTILAYER FILM, CONTROL DEVICE OF VACUUM FILM-FORMING APPARATUS, AND VACUUM FILM-FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To finish forming all layers in a comparatively short time, when forming a multilayer film. SOLUTION: A method for forming the multilayer film consisting of two or more layers by heating a raw material of the film with an electron gun, includes main heating processes R2 and R4 for evaporating the raw material of the film toward a substrate arranged in a vacuum chamber, and preheating processes R1 and R3 for preheating the raw material of the film. While the main heating process R2 is forming one film with one of the several electron guns, the preheating process R3 forms another film with the other electron gun.
申请公布号 JP2002256418(A) 申请公布日期 2002.09.11
申请号 JP20010057830 申请日期 2001.03.02
申请人 SHIN MEIWA IND CO LTD 发明人 WATABE TAKASHI;KONDO TAKAHIKO;YAMAKAWA KENJI
分类号 C23C14/30;C23C14/56;(IPC1-7):C23C14/30 主分类号 C23C14/30
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