发明名称 CHEMICAL CLEANING DEVICE
摘要 PROBLEM TO BE SOLVED: To make a chemical cleaning executable while maintaining a proper concentration of iron by elution of iron ions or increasing the iron ion concentration in a system when it becomes impossible to maintain the irreducibly minimal iron concentration during the chemical cleaning. SOLUTION: Where structures such as piping and equipment used in radiation handling facilities are set as objects to be cleaned 1, a cleaning liquid circulation system 4 is connected to the objects 1, and cleaning liquid 3 including chemical is circulated for chemically cleaning oxide film on the surface of the structure in this chemical cleaning device. A corrosion restricting line 21 for restricting corrosion of base metal of the subject 1 is provided in a part of the cleaning liquid circulation system 4. The corrosion restricting line 21 is composed as a line 23 including carbon steel or low alloy steel connected to cleaning liquid circulation piping 5 in the cleaning liquid circulation system 4, so that the carbon steel or low alloy steel can be brought into contact with the cleaning liquid.
申请公布号 JP2002257985(A) 申请公布日期 2002.09.11
申请号 JP20010057032 申请日期 2001.03.01
申请人 TOSHIBA CORP;TOSHIBA ENG CO LTD 发明人 AOI HIROMI;TODA MASAMI;KANEZAKI TAKESHI;KAJINUMA HITOSHI;SAITO YOSHIHISA
分类号 G21F9/28;C23G1/04;(IPC1-7):G21F9/28 主分类号 G21F9/28
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