DEVICE AND METHOD FOR ALIGNER

摘要

PROBLEM TO BE SOLVED: To prevent a device from becoming worse in quality even when part of a pattern is repeatedly exposed on a substrate. SOLUTION: A mask is lit up with the exposure light emitted by an optical integrator 14 which forms light source images and part of the pattern of the mask is repeatedly exposed on the substrate. This device is equipped with an illuminance adjusting device PF which is arranged on the surface of the optical integrator 14 which is conjugate to the mask and adjusts the illuminance of the repeatedly exposed part and moving devices 51 and 52 which move the illuminance adjusting device PF in the conjugate surface.