发明名称 METHOD FOR FORMING SILICIDE LAYER AND METAL MEMBER HAVING SILICIDE LAYER
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a silicide layer which can improve corrosion resistance of a metal member. SOLUTION: The method for forming the silicide layer on the surface of the metal member consisting of an electroconductive material by electrodeposition, after immersing the metal member into a molten salt bath, comprises employing the molten salt bath provided by heating/melting a salt including Si and an another salt including at least one metal element selected among W, Mo, and Nb, or by heating/melting the salt including Si, a salt including at least one metal element selected among W, Mo, and Nb, and a salt including at least one metal element selected among Cr, Al, and Ni. Thereby, the method can improve corrosion resistance of the metal member, because it can form the silicide layer consisting of a high melting metal, or complexed silicide layer composed of the high melting metal and an oxide-film forming metal.
申请公布号 JP2002256487(A) 申请公布日期 2002.09.11
申请号 JP20010053254 申请日期 2001.02.28
申请人 MITSUI ENG & SHIPBUILD CO LTD 发明人 IZUMIYA KOICHI;ONO SHOZO;IRIE TAKAHIRO
分类号 C25D9/04;(IPC1-7):C25D9/04 主分类号 C25D9/04
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