| 摘要 |
PROBLEM TO BE SOLVED: To greatly reduce a deposited amount of polysilane inside an exhaust pipe, shorten a time for cleaning treatment, reduce the consumed amount of raw materials for cleaning, decrease degradation of an oil in an exhaust pump, and decrease degradation of an exhaust pump. SOLUTION: An apparatus for forming a deposition film, has a reaction vessel 101, a substrate holder 105, a source-gas introducing means 192, a substrate heating means 106, a high-frequency energy introducing means 110, and the exhaust pipe 111, and arranges a heater 195 made from graphite material inside the exhaust pipe 111, which has a ClF3 gas introducing means 138. A method for forming the deposition film includes forming the deposition film by heating inside of the exhaust pipe 111 with the heater 195 made from the graphite material, and using the ClF3 gas for cleaning treatment after forming the deposition film.
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