POSITIVE TYPE PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive type photoresist composition for exposure with far UV ensuring an expanded focal depth and improved foreign matter on a resist pattern. SOLUTION: The positive type photoresist composition contains a compound which generates an acid when irradiated with active light or radiation, an alkali-insoluble or slightly alkali-soluble resin having solubility in an alkali developing solution increased when decomposed by the action of the acid and a compound represented by a specified structure.