| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing an optical modulator of which yield can be made high. SOLUTION: A first substrate 100A formed with driving electrodes 130 and a second substrate 200A are prepared. The second substrate 200A is formed by using an SOI substrate consisting of a silicon substrate 250, a silicon oxidized layer 225 and a silicon single crystal layer 260. The first substrate 100A and the second substrate 200A are joined to each other. The silicon substrate 250 is removed by wet etching with the silicon oxidized layer 225 as an etching stopper. After a reflection layer 227 is formed, the silicon single crystal layer 260 is patterned, by which micromirrors 220 are formed.
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