| 摘要 |
PURPOSE: A method and a computer program for optimizing the illumination profile, a preparation method of a device, a lithography projection device, and a method and a computer for optimizing the specific mask pattern are provided to obtain a suitable illumination mode based on the characteristic of a specific mask pattern. CONSTITUTION: The illumination profile is optimized by defining the transmission cross coefficient function to the optical system provided with an illuminating device and a pattern; determining an appropriate illumination mode based on diffraction orders of the reticle; and the autocorrelating the projection optic. Excess DC light is reduced, thereby improving the depth of focus by eliminating the parts of the illumination pattern which has no influence on modulation, Pitch is reduced and the probability density function of the space width is discretized by the addition of sub-resolution features. |
