| 摘要 |
PURPOSE: An improved dose sensing and control system which avoids or alleviates the problems of known energy sensors and dose control systems is provided. CONSTITUTION: The lithographic projection apparatus comprises a radiation system for providing a projection beam of radiation; patterning means, for patterning the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for imaging the patterned beam onto a target portion of the substrate, wherein the lithographic projection apparatus further comprises a sensor arranged to detect luminescence radiation produced in the projection system by the passage of the projection beam. The device manufacturing method comprises the steps of providing a substrate that is at least partially covered by a layer of radiation-sensitive material; providing a projection beam of radiation using a radiation system; using patterning means to endow the projection beam with a pattern in its cross-section; and projecting the patterned beam of radiation onto a target area of the layer of radiation-sensitive material of the substrate, wherein the device manufacturing method further comprises the step of detecting luminescence radiation produced in the projection system by the passage of the projection beam.
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