发明名称 METHOD AND APPARATUS FOR MANUFACTURING MICROLENS SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a method and apparatus for manufacturing a microlens substrate capable of easily, accurately and certainly performing alignment of first and second substrates. SOLUTION: The microlens substrate 1 has a first substrate 2 provided with a plurality of first recessed parts 38 and first alignment marks 71, a second substrate 8 provided with a plurality of second recessed parts 39 and second alignment marks 72, a resin layer 9 and a spacer 5. Microlenses 4 are formed to the resin layer 9 by the resin charged in the gaps between the first and second recessed parts 38 and 39. At the time of manufacture, an uncured resin is supplied to the first substrate 2, and the first and second substrates 2 and 8 are joined through the resin under reduced pressure or vacuum. The first and second substrates 2 and 8 are relatively moved while the distance between the substrates is held by the spacer 5 and the first and second alignment marks 71 and 72 are used to align the first and second substrates 2 and 8. Subsequently, the resin is cured.
申请公布号 JP2002254444(A) 申请公布日期 2002.09.11
申请号 JP20010062519 申请日期 2001.03.06
申请人 SEIKO EPSON CORP 发明人 YOTSUYA SHINICHI;SHIMIZU NOBUO;HARA KAZUHIRO;KOBAYASHI YOSHITAKE
分类号 G02B3/00;B29C39/10;B29C39/26;B81C3/00;(IPC1-7):B29C39/10 主分类号 G02B3/00
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