| 摘要 |
PROBLEM TO BE SOLVED: To provide a color photosensitive composition excellent in heat resistance, light resistance, spectral characteristics and color purity and suitable for the manufacture of a color filter by a photolithographic method. SOLUTION: The color photosensitive composition is prepared by stirring and dissolving a photosensitive resin composition and dyes. Since dyes are used, fine pixels having especially excellent spectral characteristics and color purity can be formed from the obtained color photosensitive composition and bleed-out of dyes by development can be suppressed. |
