| 摘要 |
PROBLEM TO BE SOLVED: To provide a magnetron sputtering device which can form a film of little damage and high density, and has high utilizing efficiency for a target. SOLUTION: The magnetron sputtering device having the target to be sputtered and a magnetic-field generating means arranged at a rear side in order to generate a magnetic field on a surface of the target, comprises arranging several first magnetic-field generating means at the back side of the target, and arranging second magnetic-field generating means having an opposite magnetic pole against the first generating means through a yoke, in vicinity of or behind the first generating means which is located at the brim side of the target, to form the unbalanced magnetic fields on the surface side of the target.
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